The joint expertise of ANL and FNAL has led to the production of Nb3Sn undulator magnets in operation in the ANL Advanced Photon Source (APS). These magnets showed performance reproducibility close to the short sample limit, and a design field increase of 20% at 820A. However, the long training did not allow obtaining the expected 50% increase of the on-axis magnetic field with respect to the ~1 T produced at 450 A current in the ANL NbTi undulator. To address this, 10-pole long undulator prototypes were fabricated, and CTD-101K was replaced as impregnation material with TELENE, an organic olefin-based thermosetting dicyclopentadiene resin produced by RIMTEC Corporation, Japan. Training and magnet retraining after a thermal cycle were nearly eliminated, with only a couple of quenches needed before reaching short sample limit at over 1,100 A. TELENE will enable operation of Nb3Sn undulators much closer to their short sample limit, expanding the energy range and brightness intensity of light sources. TELENE is Co-60 gamma radiation resistant up to 7-8 MGy, and therefore already applicable to impregnate planar, helical and universal devices operating in lower radiation environments than high energy colliders.